Inductively Coupled Plasma Deep Reactive Ion Etch

Award NoticeNo Set AsideAwarded

This federal contract opportunity has been awarded to on September 25, 2025.

Award Information

This solicitation resulted in an award to for approximately $687,896 on September 25, 2025. Similar contracts are typically issued by DEPT OF DEFENSE under 333242 (Semiconductor Machinery Manufacturing).

Award Number: N0017325P0063
Award Amount: $687,896
Award Date: September 25, 2025

View full award details on USASpending.gov

Key Takeaways

No response deadline specified - contact the agency for details
Set-aside for No Set Aside businesses
Work to be performed in WASHINGTON, DC
Industry: Semiconductor Machinery Manufacturing

Contract Details

Notice ID: N0017325P0063
Opportunity Type: Award Notice
Agency: DEPT OF DEFENSE
Sub-Agency: DEPT OF THE NAVY
Office: NAVAL RESEARCH LABORATORY
Posted Date: Friday, September 26, 2025
Response Deadline: Not specified
NAICS Code: 333242 - Semiconductor Machinery Manufacturing
PSC Code: 3670
Set-Aside: No Set Aside
Place of Performance: WASHINGTON, DC, 20375-5328
Status: Active

View on SAM.gov

Description

The awarded contract is a non-competitive, firm-fixed price award to the awardee specified.

Why This Opportunity Matters

The Department of DEFENSE is seeking responses for semiconductor machinery manufacturing with a set-aside for No Set Aside businesses in WASHINGTON, DC. This set-aside designation means eligible businesses face reduced competition from larger firms.